[10p-E218-1~13] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[10p-E218-11] Application study of hydrogen-atmosphere surface-treatment using the Minimal laser heating tool to semiconductor CMOS devices(Ⅳ)

〇kazushige sato^1,2, Takashi Chiba^1,2, Masao Terada^1,2, Kengo Hamada^1,2, Yoshiaki Kanamori³, Noriko Miura⁴, Shinichi Ikeda⁴, Shiro Hara⁴ (1.MINIMAL, 2.SAKAGUCHI, 3.TOHOKU UNIV., 4.AIST)

Keywords:

laser heating