[10p-F211-1~8] Interfacial Nanoelectrochemistry for Next-Generation Semiconductor Strategies - From Geopolitics to Advanced Wet Processing -

4:15 PM - 4:45 PM JST(7:15 AM - 7:45 AM UTC)

[10p-F211-7] Elucidation of Wafer Charging Mechanism in Semiconductor Wet Cleaning Processes Using an Inkjet Method

〇Yuki Tsuchiya¹, Yasunori Takahashi¹, Kota Sugiura², Jundai Sato², Yoshiyuki Seike² (1.Ricoh, 2.AIT)

Keywords:

semiconductor,wet process