Presentation Information

Symposium (Oral)Symposium : Atomic Layer Process (ALP) analysis and application technologies (4)

[11a-B21-1~7]Atomic Layer Process (ALP) analysis and application technologies (4)

Fri. Sep 11, 2026 9:00 AM - 11:30 AM JST
Fri. Sep 11, 2026 12:00 AM - 2:30 AM UTC

B21 (Faculty of Engineering B Block)

Chair : Takeshi Momose(Kumamoto Univ.), Kazuhiro Karahashi(Nagoya Univ.)

This symposium provides a comprehensive overview of atomic layer processes (ALP), including atomic layer deposition (ALD) and atomic layer etching (ALE), which are becoming increasingly important in advanced semiconductor device manufacturing, from both analytical and application perspectives.
The morning session will be conducted in English and will feature six presentations: three invited talks by international speakers on ALD and emerging materials for next-generation semiconductor devices, and three contributed talks on reaction analysis using approaches such as kinetic Monte Carlo (KMC) simulations and neural network potentials (NNPs).

11:00 AM - 11:30 AM JST(2:00 AM - 2:30 AM UTC)English Presentation

[11a-B21-7]Transition metal carbide thin films prepared by atomic layer deposition: A new enabler for advanced metallization process

〇Soo-Hyun Kim¹ (1.Ulsan National Institute of Science and Technology)

Keywords:

ALP

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