[11a-E201-1~8] 13.3 Insulator technology

9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[11a-E201-3] In-situ atomic layer deposition of Al₂O₃/GeO₂/Ge structure

〇Yoshiki Kato¹, Mitsuo Sakashita¹, Masashi Kurosawa¹, Osamu Nakatsuka^1,2, Shigehisa Shibayama¹ (1.Grad.Sch.Eng.,Nagoya Univ., 2.IMaSS,Nagoya Univ.)

Keywords:

Atomic Layer Deposition,Passivation,Ge