[11a-E201-1~8] 13.3 Insulator technology

10:30 AM - 10:45 AM JST(1:30 AM - 1:45 AM UTC)

[11a-E201-7] Evaluation of TiO₂-mixed dipole layers for multi-V_th control

〇Takefumi Kamioka^1,6, Toshihide Nabatame^2,6, Hiroyuki Matsukawa^3,6, Takamasa Kawanago^1,6, Yukinori Morita^1,6, Kasidit Toprasertpong^3,6, Yuichiro Mitani^4,6, Takashi Onaya^2,6, Naoki Fukata^2,6, Wipakorn Jevasuwan^2,6, Kazuhito Tsukagoshi^2,6, Koji Kita^3,6, Atsushi Tamura^3,6, Takuya Hoshii^5,6, Naoya Okada^1,6, Kenzo Manabe^1,6, Wataru Mizubayashi^1,6, Hiroyuki Ota^1,6, Takashi Matsukawa^1,6, Shinji Migita^1,6 (1.SFRC, AIST, 2.NIMS, 3.Univ. of Tokyo, 4.Tokyo City Univ., 5.Science Tokyo, 6.LSTC)

Keywords:

high-k gate stack,dipole,threshold voltage