[11a-E301-1~11] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[11a-E301-3] Low-Temperature Growth of In₂O₃ Thin Films on SiO₂/Si Substrates by Mist CVD

〇(M2)Tarou Iizuka¹, Ryo Ishikawa¹, Ryu Yamamoto¹, Haruki Ishikawa¹, Ryuma Iida¹, Koutarou Ogawa¹, Shinya Aikawa¹, Takeyoshi Onuma¹, Tohru Honda¹, Tomohiro Yamaguchi¹ (1.Kogakuin University)

Keywords:

Thin Film growth,Mist CVD,Low-Temperature Deposition