[11a-E301-1~11] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[11a-E301-5] The relationship between annealing conditions and localized surface plasmon resonance wavelength of silver thin films made by mist CVD

〇Kei Mizumotm², Ryosuke Ohashi², Tiaki Watanabw¹, Ryouma Yosida¹, Htet Su¹, Sohaib Hassan¹, Toshiyuki Kawaharamura^1,2,3 (1.School of Sys. Eng., 2.Graduate School of Eng., 3.Res. Inst)

Keywords:

Ag,Mist CVD,LSPR

Mist chemical vapor deposition (Mist CVD) has mainly been developed as a fabrication technique for metal oxide thin films. Meanwhile, our laboratory has successfully extended this technique to metallic thin films such as Cu and Pd. We have also succeeded in fabricating Ag thin films and demonstrated the appearance of localized surface plasmon resonance (LSPR) under specific deposition conditions. However, the conditions required for controlling the LSPR resonance wavelength remain unclear. In this study, Ag thin films fabricated by Mist CVD were annealed, and the effects of annealing conditions on their LSPR characteristics were investigated.