[11p-B21-1~9] Atomic Layer Process (ALP) analysis and application technologies (4)

1:30 PM - 2:00 PM JST(4:30 AM - 5:00 AM UTC)

[11p-B21-2] Opening Next-Gen Semiconductors with Nano-Layers

〇Hiroshi Ashihara¹ (1.KOKUSAI ELECTRIC)

Keywords:

semiconductor,atomic layer deposition,thin film

I will explain thin-film deposition technologies used in the manufacturing of cutting-edge semiconductor devices. In particular, I also discuss the current applications and challenges of ALD, a nanoscale thin-film deposition method, as well as the future Beyond ALD that will be needed.