[11p-B21-1~9] Atomic Layer Process (ALP) analysis and application technologies (4)

2:45 PM - 3:15 PM JST(5:45 AM - 6:15 AM UTC)

[11p-B21-4] Understanding and Control of Thin-Film Formation via Plasma Process Informatics

〇Kunihiro Kamataki¹, Sukma Fitriani², Kazuki Nagamine^1,2, Masaharu Shiratani¹ (1.Kyushu Univ. ISEE., 2.Kyushu Univ. IMI.)

Keywords:

Semiconductor plasma processes,Process informatics,Physics-based feature engineering

In thin-film formation using semiconductor plasma processes, precise control of film properties such as thickness, composition, and stress is essential. This presentation introduces plasma process informatics that combines OES diagnostics with machine learning for PECVD processes. In particular, based on the PaMIS framework, optical emission information is converted into physics based features such as electron density, electron temperature, and ion, radical fluxes. The application of this approach to film property prediction and process interpretation for SiO2 and DLC thin films will be discussed.