Presentation Information
[11p-E201-6]Investigation of oxygen migration in Layered HfO2 by application of cyclic electric field
〇Seiyo Yoshida1,2, Takao Shimizu2, Yuka Takagi1, Isao Sakaguchi2 (1.Tokyo Univ. of Sci., 2.NIMS)
Keywords:
HfO2 thin films,oxygen-18 isotope,Nd-doped
In HfO2-based ferroelectrics, the wake-up and fatigue effects have been suggested to be related to the migration of oxygen vacancies. In this study, laminated thin films containing an 18O-enriched layer were fabricated, and the migration of oxygen and oxygen vacancies induced by electric-field cycling was investigated using secondary ion mass spectrometry (SIMS). The results showed that the 18O concentration near the film surface decreased and migrated toward the interior of the film with increasing numbers of electric-field cycles, suggesting a correlation with oxygen-vacancy migration.
