Presentation Information

9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[8a-N102-2]Practical estimation of a dual-sided reference flatness surface from single-sided wafer measurements

〇Masaki Takaishi¹, Yu Fujimura¹, Kevin Operiano¹, Susumu Maeda¹, Takao Sawada², Satoshi Kuwabara² (1.Aixtal, 2.Kohzu Precision)

Keywords:

Measurement Informatics,Surface profile measurement,SORI

We investigated a method for estimating the dual-sided reference flatness (SORI) of semiconductor wafers using only single-sided measurement data. By combining extracted shape features with regression models, high estimation accuracy was achieved for normal wafers, demonstrating the effectiveness of the approach in reducing measurement time. However, degraded accuracy was observed for wafers with non-typical shapes, indicating that shape diversity remains a key challenge.

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