Presentation Information
[8a-PA3-10]Formation of Ultrafine Lamellar Structures and Their Orientation Characteristics in High-χ
Block Copolymers
〇RYOTA ABE1, YUTA SHIKI1, MIZUKI KISHIMOTO1, YUJI MIZOBE1, SEIYA KIKUCHI1 (1.Mitsui Chemicals, Inc.)
Keywords:
Self-Assembly,Lithography,Patterning Technology
Directed Self-Assembly (DSA) has attracted significant attention as a next-generation lithography technique due to its capability for fine patterning. In this study, the authors demonstrate that a block copolymer composed of polyolefin and poly(methyl methacrylate) forms a lamellar structure with a half-pitch of 6.5 nm through self-assembly. Furthermore, A detailed investigation of the orientation of the self-assembled structures revealed that the lamellae are oriented perpendicular to the substrate.