Presentation Information
[8a-PA3-3]Wet Etching Characteristics of MoN Thin Films in HNO3 Etchant
〇(M1)Yuichiro Deguchi1, Yuta Fujisawa1, Ryohei Sibata1, Mitunori Toyoda1 (1.Tokyo Polytechnic Univ.)
Keywords:
Byond EUV,EUV,Multilayer mirror
The chemical etching characteristics of MoN thin films, which are expected to be applied to next-generation EUV mirrors, were evaluated for atomic-scale shape control. MoN thin films deposited via reactive sputtering and Mo single-layer films were observed using an automated etching system with an HNO3 solution. The results revealed a distinct difference in their dissolution behaviors: whereas the Mo single-layer film dissolved gradually after the formation of a surface oxide layer, the topmost layer of the MoN thin film dissolved directly into the etchant.