Presentation Information
[8a-PA3-9]Molecular dynamics study of early stages of development process for chemically amplified resists
〇Kosei Tada1, Hiroto Wakamatsu1, Masaaki Yasuda1 (1.Osaka Met. Univ.)
Keywords:
development,resist,lithography
With current lithography technology, pattern sizes are approaching the size of resist molecules, making molecular-level simulations essential for analyzing pattern formation. In this study, we performed molecular dynamics simulations on a chemically amplified resist which enables higher-sensitivity exposure to analyze molecular behavior during the initial stages of development.