[8p-A21-1~18] 6.4 Thin films and New materials

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[8p-A21-7] Thin film growth of HfN superconductor on ScAlMgO₄ by pulsed laser deposition

〇Yusuke Tanaka¹, Yoshiharu Krockenberger¹, Haruki Sanada¹, Junsaku Nitta^1,2, Yoji Kunihashi¹ (1.NTT-BRL, 2.Tohoku Univ.)

Keywords:

superconductor,nitride,thin film

In this study, HfN thin films were grown on ScAlMgO₄ (SCAM) substrates by pulsed laser deposition (PLD), and the relationship between growth conditions, crystallinity, and electrical transport properties was investigated. By optimizing the substrate temperature and nitrogen/argon partial pressures, we successfully obtained HfN(111)-oriented thin films on SCAM substrates. The films exhibited metallic conduction with an RRR of approximately 3.0 and a superconducting transition temperature of T_c ≈ 8.6 K, close to the bulk value.