Session Details
[8p-A21-1~18]6.4 Thin films and New materials
Tue. Sep 8, 2026 1:30 PM - 6:30 PM JST
Tue. Sep 8, 2026 4:30 AM - 9:30 AM UTC
Tue. Sep 8, 2026 4:30 AM - 9:30 AM UTC
A21 (Faculty of Info. Sci. & Tech. Bldg.)
[8p-A21-1][Invited Talk] Improving the operating temperature and enhancing the performance of GeSn/GeSiSn resonant tunnel diodes
〇Shota Torimoto1, Shuto Ishimoto1, Yoshiki Kato1, Mitsuo Sakashita1, Masashi Kurosawa1, Osamu Nakatsuka1,2, Shigehisa Shibayama1 (1.Grad. Sch. of Eng., Nagoya Univ., 2.IMaSS, Nagoya Univ.)
[8p-A21-2][Invited Talk] Defect-Level Analysis of Hydrogen-Compensated Polycrystalline Ge Thin Films
〇Koki Nozawa1, Takashi Suemasu1, Kaoru Toko1 (1.Univ. of. Tsukuba)
[8p-A21-3]Study of thermoelectric properties in sputtered Si-Ge thin films
〇(P)Madhuvathani Saminathan1, Priyanka Sangwan1, Kenji Watanabe1, Mahasuru Matsunami1, Tsunehiro Takeuchi1 (1.Toyota Tech. Inst.)
[8p-A21-4]Irreversible resistance changes in electric double-layer devices with metal alloy channels
〇(M1)Ippei Ohga1, Yuta Nakamura1, Kohei Fujiwara1 (1.Rikkyo Univ.)
[8p-A21-5]N2 bubbled carrier gas through an NH3 aqueous solution for Cu3N growth by Mist CVD
〇Azuki Morita1, Chisato Tsukioka1, Tomohiro Yamaguchi1, Hiroki Nagai1, Takeyoshi Onuma1, Tohru Honda1 (1.Kogakuin Univ.)
[8p-A21-6]Inversion of carrier polarity and metallization of Cu3Nfilmsby Zn doping
〇Mizuki Nakazono1, Yamada Naoomi1 (1.Chubu Univ.)
[8p-A21-7]Thin film growth of HfN superconductor on ScAlMgO4 by pulsed laser deposition
〇Yusuke Tanaka1, Yoshiharu Krockenberger1, Haruki Sanada1, Junsaku Nitta1,2, Yoji Kunihashi1 (1.NTT-BRL, 2.Tohoku Univ.)
[8p-A21-8]Thermoelectric properties of Al-Cu-Fe thin film deposited on Sr(Ti1-xNbx)O3 substrate
〇(P)Priyanka Sangwan1,2, Kenji Watanabe1,2, Madhuvthani Saminathan1, Toshiaki Fujita3, Masaharu Matsunami1,2, Tsunehiro Takeuchi1,2 (1.Toyota Tech. Inst., 2.JST- MIRAI, 3.Mitsubishi Material Corp.)
[8p-A21-9]Substrate-dependent epitaxy of ultrathin continuous <001>-oriented Pt films on MgO and SrTiO3 substrates
〇Soushi Akita1, Yuki Sobukawa1, Kaoru Toko1, Takashi Suemasu1 (1.Tsukuba Univ.)
[8p-A21-10]Fabrication of free-standing cerium fluoride membrane using a water-soluble sacrificial layer and topochemical reaction
〇Akiko Kamigaito1, Ayuka Nakano1, Makoto Minohara2, Akira Chikamatsu1 (1.Ochanomizu Univ., 2.AIST)
[8p-A21-11]Anisotropic electronic states of oxygen in a strontium titanate thin film by soft X-ray absorption spectroscopy using a superconducting detector
〇(M1)Kota Naito1, Nobuo Nakajima1, Weirong Yang2, Shintaro Yasui2, Shigetomo Shiki3, Andris Anspoks4 (1.Grad. Sch. of Adv. Sci. & Eng., Hiroshima Univ., 2.ZC lab, Science Tokyo, 3.AIST, 4.ISSP, Univ. of Latvia)
[8p-A21-12]Dependence of Protonation-Induced Thermal Conductivity Switching Range on Mosaicity in Epitaxial LaNiO3 Thin Films on Si Substrates
〇Haruka Zaizen1, Haobo Li1,2, Osamu Nakagawara3, Ahrong Jeong4, Hiromichi Ohta4, Hidekazu Tanaka1,2 (1.SANKEN, The Univ. of Osaka, 2.OTRI, 3.I-PEX Piezo Solutions Inc, 4.RIES, Univ. of Hokkaido)
[8p-A21-13]Thermal conductivity of In2O3 thin films
〇(D)Hikaru Sadahira1, Mitsuki Yoshimura1, Prashant Ghediya2, Yusaku Magari2, Hiromichi Ohta2 (1.IST-Hokkaido Univ., 2.RIES-Hokkaido Univ.)
[8p-A21-14]Low Refractive Index SiO2 Optical Thin Film Deposited by Sputtering and Electron Beam Evaporation part 6
〇kota morikawa1, tajima naoya1, wakamiya taisei2, murotani hiroshi1 (1.Graduate School of Eng., Tokai Univ., 2.The Japan Steel Works,LTD.)
[8p-A21-15]Improving the Performance of PEFC stainless steel separators with thin oxide films
through Surface Treatment.
〇(M2)Yuna Tenma1, Kato Shinya1 (1.Meikou University.)
[8p-A21-16]Synthesis of oriented thin films of metal organic framework by Mist CVD
〇(M1)Yuta Konemura1, Daichi Oka1, Ibuki Shoda1, Yuki Inoue1, Yasushi Hirose1 (1.Tokyo Metropolitan Univ.)
[8p-A21-17]Characterization of Ru–Re alloy thin films for superconducting circuit applications
〇Koryo Masuzawa1,2, Sikdar Subhrajit1, Kota Furukawa1,2, Takayuki Harada1,2 (1.NIMS, 2.Tokyo Univ. of Science)
[8p-A21-18]Cu Resistivity Reduction by Ta Surface Chemical-State Control Based on In-situ XPS Analysis
〇Yukiaki Oono1, Yousuke Machida1, Kazuhiko Tonari1, Kyouji Notaki2, Mauo Sogou2, Daisuke Sakai2, Shuzo Fujimura2,3 (1.ULVAC Inc., 2.ULVAC-PHI Inc., 3.Science Tokyo)
