[8p-B11-1~16] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:30 PM - 4:45 PM JST(7:30 AM - 7:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[8p-B11-10] Analysis of Wiggling Mechanisms in Fine ACL Patterns

〇Taiga Kasai¹, Miyako Matsui², Makoto Miura¹, Kenichi Kuwahara¹ (1.Hitachi High-Tech Corp., 2.Hitachi Ltd., R&D Group)

Keywords:

etching,MOR,wiggling

In recent years, with advances in extreme ultraviolet (EUV) lithography, metal oxide resist (MOR) has attracted attention as a high-resolution resist. Fine MOR patterns are transferred to underlying layers via an amorphous carbon layer (ACL). However, wavelike deformation of ACL patterns, referred to as wiggling, remains a challenge during ACL etching. In this study, we investigated the mechanisms of wiggling as functions of pattern aspect ratio and MOR thickness.