[8p-B11-1~16] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:30 PM - 5:45 PM JST(8:30 AM - 8:45 AM UTC)

[8p-B11-13] valuation of a Machine Learning Model for Predicting SiO₂ Film Etching Rate
Based on Plasma and Material Information Science

〇(M2)Kazuki Nagamine^1,2, S.W Fitriani², Takayoshi Tsutsumi³, Masaharu Shiratani¹, Kunihiro Kamataki¹ (1.Kyushu Univ. ISEE, 2.Kyushu Univ. JGMI, 3.Nagoya Univ. cLPS)

Keywords:

Plasma Etching,Machine learning,Plasma and Material Information Science