Presentation Information
[8p-E206-2]Phase matching in the layer-by-layer design method for extreme-ultraviolet multilayer mirrors
〇Takeo Ejima1 (1.Tohoku Univ., SRIS)
Keywords:
reflective multilayer,reflection phase,extreme ultraviolet
With the increase in NA for EUV lithography, wider reflection angle ranges and precise control of reflection phase in reflective optical systems are required. Conventional multilayer design methods determine reflectivity through numerical phase matching, but suffer from instability and high computational cost. In this study, an analytical approach was introduced, improving computational stability while reducing computation time by up to half.