Session Details
[8p-E206-1~17]7.1 X-ray technologies
Tue. Sep 8, 2026 1:30 PM - 6:15 PM JST
Tue. Sep 8, 2026 4:30 AM - 9:15 AM UTC
Tue. Sep 8, 2026 4:30 AM - 9:15 AM UTC
E206 (First Year Education Bld. E Block)
[8p-E206-1]Laminar-type W/B4C graded refractive index multilayer grating exhibiting high diffraction efficiency and high spectral flux in the 300–1100 eV region
〇Masato Koike1,2,3, Tadashi Hatano2,4, Alexander Pirozhkov1, Takanori Murano3,5, Shogo Koshiya5, Masami Terauchi6 (1.KPSI, QST, 2.IMRAM, Tohoku Univ., 3.Dept. of Eng., OMU, 4.SRIS, Tohoku Univ., 5.SABU, JEOL, 6.TCMC, Tohoku Univ.)
[8p-E206-2]Phase matching in the layer-by-layer design method for extreme-ultraviolet multilayer mirrors
〇Takeo Ejima1 (1.Tohoku Univ., SRIS)
[8p-E206-3]Wavefront Aberration Correction via Layer-by-Layer Etching of Schwarzschild Mirrors for EUV Microscopy
〇Ryohei Shibata1, Deguchi Yuichiro1, Shun Uji1, Yuta Fujisawa1, Takao Tanabe1, Mitsunori Toyoda1 (1.Tokyo Polytechnic Univ.)
[8p-E206-4]High Reflectivity Mo/Si Multilayer Mirrors with Nitride Barrier Layers (2)
〇(M2)Yuta Fujisawa1, Maidul HAQUE1, Shun UJI1, Ryohei SHIBATA1, Mitsunori TOYODA1 (1.Tokyo Polytechnic Univ.)
[8p-E206-5]Imaging Performance Evaluation of an EUV Microscope Objective Mirror via High-Precision Wavefront Control
〇(P)Shun Uji1, Yuta Fujisawa1, Takao Tanabe1, S. Maidul Haque1, Mitsunori Toyoda1 (1.Tokyo Polytechnic Univ.)
[8p-E206-6]Atomic Process of multiply charged ions in the EUV lithography
〇Akira Sasaki1,2 (1.KPSI, QST, 2.ILE, Univ. Osaka)
[8p-E206-7]Comparative Collective Thomson Scattering Study of Single- and Dual-Trigger Laser-Assisted Discharge Tin Plasmas for EUV Sources
〇Hideyuki Sera1,2, Akihisa Nagano1, Kentaro Tomita2 (1.Ushio inc., 2.Hokkaido univ.)
[8p-E206-8]Laser wavelength dependence of Sn-droplet EUV conversion efficiency
〇(M1)Naoki Nagahama1, Hayato Yazawa1, Shunya Yamamoto1, Yuta Takai1, Kaito Nishimiya2, Eiji Takahashi2, Takeshi Higashiguchi1 (1.Utsunomiya Univ., 2.RIKEN)
[8p-E206-9]Observation of fast ions from laser-produced Sn plasma EUV source
〇(M1)Yuta Takai1, Hayato Yazawa1, Shunya Yamamoto1, Naoki Nagahama1, Kaito Nishimiya2, Eiji Takahashi2, Takeshi Higashiguchi1 (1.Utsunomiya Univ., 2.RIKEN.)
[8p-E206-10]Suppression of High-Energy Ions from EUV Source Plasmas through Control of the Initial Electron Density
〇(M2)Yasushi Shirai1, Kentaro Tomita1 (1.hokkaido Univ.)
[8p-E206-11]Exploring optimal conditions toward shorter-wavelength driver lasers for EUV sources
〇Nozomi Tanaka1,2, Yu Yamamoto1, Akira Sasaki1,3, Katsunobu Nishihara1,4, Yuji Takagi1, Atsushi Sunahara1,5, Tomoyuki Johzaki1,6, Kentaro Tomita7, Shinsuke Fujioka1, Masashi Yoshimura1 (1.ILE, U. Osaka, 2.NIFS, 3.QST, 4.OMU, 5.Purdue University, 6.Hiroshima University, 7.Hokkaido University)
[8p-E206-12]The Observation of Ultrafast Transient Decrease Dynamics of Non-linearity on LiNbO3 by Time Resolved Soft X-ray Second Harmonic Generation
〇Kazuhiro Miyazawa1, XingYu Su1, Tobias Lojewski1, Masafumi Horio1, Iwao Matsuda1 (1.ISSP, UTokyo)
[8p-E206-13]A CT-Guided XRD System Combined with Micro X-ray CT and Pencil-Beam XRD
〇Akio Yoneyama1, Masahide Kawamoto1, Satoshi Takeya2 (1.SAGA-LS, 2.AIST)
[8p-E206-14]4D X-ray Tomography of Live Crustaceans Using a Synchrotron Multi-beam Optical System
〇Wataru Yashiro1,2,3,4, Rinno Ubukata2, Hiroki Sumiishi2, Kenji Kikuchi2, Chika Kamezawa3,2, Stephen Fenner3,2, Xiaoyu Liang3,2, Ryosuke Ueda1, Kanae Semba3, Wolfgang Voegeli5, Tetsuroh Shirasawa6, Kentaro Kajiwara7, Hiroyuki Kudo8 (1.SRIS, Tohoku Univ., 2.Grad. Eng., Tohoku Univ., 3.IMRAM, Tohoku Univ., 4.Dent., Tohoku Univ., 5.Edu., Tokyo Gakugei Univ., 6.NMIJ, AIST, 7.JASRI, 8.Info. & Sys., Univ. Tsukuba)
[8p-E206-15]Field-of-view expansion for X-ray phase CT using deep learning
〇Momotaro Umetsu1, Atsushi Momose1 (1.Tohoku Univ.)
[8p-E206-16]Simulation study on Talbot-Lau X-ray phase imaging using parabolic gratings.
〇Taisei Usubuchi1, Yoshichika Seki1, Atsushi Momose1 (1.Tohoku Univ.)
[8p-E206-17]Metal Lithium Imaging Using High-Energy Monochromatic X-ray CT
〇Ritsuki Nishimura1, Hiroshi Sakurai1, Futoshi Utsuno2, Yumeto Shibata1, Kousuke Suzuki1, Kazushi Hoshi1, Yuki Furuta1, Naoki Sunaguti3 (1.Gunma univ., 2.Idemitsu Kosan Co., 3.KEK-PF)
