Presentation Information

2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)

[8p-E206-3]Wavefront Aberration Correction via Layer-by-Layer Etching of Schwarzschild Mirrors for EUV Microscopy

〇Ryohei Shibata¹, Deguchi Yuichiro¹, Shun Uji¹, Yuta Fujisawa¹, Takao Tanabe¹, Mitsunori Toyoda¹ (1.Tokyo Polytechnic Univ.)

Keywords:

Mo/Si multilayer mirror,Extreme Ultraviolet(EUV)

We study precise wavefront control of Mo/Si multilayer mirrors used for EUV Schwarzschild optics, which operate at a wavelength of 13.5 nm, via layer-by-layer etching, and have achieved selective removal of Mo and Si single layers using NaOH and HNO₃. In this presentation, we report the results of examining the shape of a selectable-area mask designed to optimally compensate for the residual wavefront aberration in Schwarzschild optics.

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