Presentation Information
[8p-E206-5]Imaging Performance Evaluation of an EUV Microscope Objective Mirror via High-Precision Wavefront Control
〇(P)Shun Uji1, Yuta Fujisawa1, Takao Tanabe1, S. Maidul Haque1, Mitsunori Toyoda1 (1.Tokyo Polytechnic Univ.)
Keywords:
Extreme Ultraviolet,EUV Microscopy,Point diffraction interferometer
Wavefront aberrations of a high-magnification objective mirror for a 13.5-nm-wavelength EUV microscope were corrected using a point diffraction interferometer (PDI). Correction of coma, spherical aberration, and astigmatism reduced the total wavefront error to 0.87 nm rms, satisfying the Maréchal criterion. The corrected mirror was implemented in the microscope, resulting in a substantial improvement in image contrast and successful observation of porous structures with feature sizes of approximately 30–50 nm.
