[8p-E206-1~17] 7.1 X-ray technologies

2:45 PM - 3:00 PM JST(5:45 AM - 6:00 AM UTC)

[8p-E206-6] Atomic Process of multiply charged ions in the EUV lithography

〇Akira Sasaki^1,2 (1.KPSI, QST, 2.ILE, Univ. Osaka)

Keywords:

EUV lithography,Atomic Processes,photo absorption

Atomic processes of multiple-charged ions in the EUVL technology are discussed. EUV emission is obtained from multiple-charged Sn ions, whereas the durability of materials against EUV exposure is considered in EUV optics, and sensitivity and roughness are considered in photoresists. In the presentation, photoabsorption of Sn is discussed as the common physics of interaction between EUV and materials.