[8p-E301-1~22] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[8p-E301-14] Effect of Mist Supply Method on Growth of (010) β-Ga₂O₃ Films by Mist CVD Method

〇(M2)Sei Saito¹, Makoto Sugitani¹, Tomohiro Yamaguchi¹, Sota Yamanaka¹, Kohei Sasaki², Akito Kuramata², Tohru Honda¹, Takeyoshi Onuma¹ (1.Kogakuin Univ., 2.Novel Crystal Technology, Inc.)

Keywords:

thin film growth,Ga2O3,Mist CVD