[8p-E301-1~22] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

1:15 PM - 1:30 PM JST(4:15 AM - 4:30 AM UTC)

[8p-E301-5] Heat-resistant Characteristics of Li doped NiO Films Deposited by RF Magnetron Sputtering

〇(M1)Shunya Matsui¹, Harunobu Yasuda¹, Hironobu Miyamoto², Kohei Sasaki², Tomohiro Yamaguchi¹, Tohru Honda¹, Takeyoshi Onuma¹ (1.Kogakuin Univ., 2.Novel Crystal Technology)

Keywords:

Li,NiO