Presentation Information
[8p-PB1-11]High-density capacitively coupled hydrogen plasma
using hollow electrode with magnets built-in
〇(M1)Sora Matsuyoshi1, Yasunori Ohtsu1 (1.Saga Univ.)
Keywords:
plasma processing
In plasma processing, Capacitively Coupled Plasma (CCP) is widely used due to its simple structure and low implementation cost. However, because CCP has a lower plasma density compared to other methods, it presents a challenge from a productivity standpoint. To achieve higher plasma density in CCP, we are investigating a method that utilizes a hollow electrode with built-in magnets. In this report, we present the results of our investigation into a new magnet configuration and our analysis of the magnetic characteristics of electrons within the plasma.