Presentation Information
[8p-PB1-14]Effect of target erosion distribution on RF magnetron sputtering plasma
〇Yusei Inoue1 (1.Saga Univ. Graduate School of Science and Engineering)
Keywords:
Magnetron sputtering
In magnetron sputtering, a doughnut-shaped V-shaped erosion groove forms on the target, affecting the ion density distribution, discharge characteristics, and film deposition distribution. To elucidate the influence of surface topography on high-frequency magnetron plasma, this study analyzed the E×B drift velocity distribution near the target using electromagnetic field simulations.