Presentation Information
[8p-PB1-6]Spatial structure of an RF unbalanced magnetron plasma
〇(M2)Tomoya Mihara1, Yasunori Ohtsu1 (1.Saga Univ.)
Keywords:
Plasma Generation,Unbalanced Magnetron
Magnetron plasmas are widely used in semiconductor processing and thin-film deposition as high-density plasma sources. In this study, the spatial structure of an RF unbalanced magnetron plasma was investigated using a heated Langmuir probe under various RF powers and argon gas pressures. A circular aluminum target equipped with a central ferrite magnet and sixteen outer neodymium magnets was employed to generate an unbalanced magnetic field. The plasma density showed a peak between the central and outer magnets, indicating enhanced electron confinement and ionization in this region. The plasma density decreased with increasing distance from the target because of plasma diffusion. Furthermore, the radial uniformity of the plasma density improved with increasing target distance, suggesting relaxation of the density gradient. These results clarify the influence of magnetic-field configuration on plasma density distribution in RF unbalanced magnetron discharges.