Presentation Information
[8p-PB1-9]Spatial structure of RF multi-hollow magnetized AZO sputtering plasma
〇Minoru Yamagata1, Yasunori Ohtsu1 (1.Saga Univ.)
Keywords:
RF sputtering
Aluminum-doped zinc oxide (AZO) is attracting attention as an alternative to ITO, but low-temperature deposition of high-quality films remains challenging. Building on a prior ring-hollow magnetized RF-sputtering source, this study examines a new multi-hollow electrode in which an additional hollow groove is formed at the center, where the permanent magnets also exert influence. The spatial structure of the ion saturation current in an argon plasma was measured for various RF powers and gas pressures. Optical emission images and probe measurements confirm that high-density plasma is generated in both the central and outer grooves.