Presentation Information
[9a-A21-2]Evaluation of interface properties of hydrogen-annealed SiC MOS structures through C–V measurements over a wide temperature range
〇Shoto Sawada1, Takuma Kobayashi1, Satoshi Iga1, Masahiro Hara1, Heiji Watanabe1 (1.UOsaka)
Keywords:
SiO2/SiC Interface
