Presentation Information

[9a-A21-2]Evaluation of interface properties of hydrogen-annealed SiC MOS structures through CV measurements over a wide temperature range

〇Shoto Sawada1, Takuma Kobayashi1, Satoshi Iga1, Masahiro Hara1, Heiji Watanabe1 (1.UOsaka)

Keywords:

SiO2/SiC Interface