[9a-PB2-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[9a-PB2-10] Evaluation of p-Type Doping and Surface Defect Formation Mechanisms in MoS₂ Surface Induced by Nitrogen Plasma Treatment

〇Taichi Sakamoto¹, Akihisa Ogino¹ (1.Shizuoka Univ.)

Keywords:

molybdenum disulfide(MoS2),microwave plasma