[9a-PB2-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment | The 87th JSAP Autumn Meeting 2026

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Poster presentation8 Plasma Electronics : 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[9a-PB2-1~15]8.2 Plasma deposition of thin film, plasma etching and surface treatment

Wed. Sep 9, 2026 9:00 AM - 10:30 AM JST
Wed. Sep 9, 2026 12:00 AM - 1:30 AM UTC

PB2 (2nd Gymnasium)

[9a-PB2-1]Fabrication of HEA Thin Films Using Powder Targets I

〇Hiroharu Kawasaki¹ (1.Nat,l Ins. Tech., Sasebo Col.)

[9a-PB2-2]Effect of process pressure on deposition of nitrogen-doped titanium dioxide thin films using plasma sputtering

〇(M1)Ryusuke Goto¹, Keigo Takeda¹ (1.Meijo Univ.)

[9a-PB2-3]Evaluation of Ion Incidence Effects on SiO₂ Sidewall Films Using Plasma and SRIM Simulations

〇Yousei Kurosaki¹, Tsukasa Masamoto¹, Atsuto Sasaki¹, Daisuke Yamashita¹, Takamasa Okumura¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹, Kunihiro Kamataki¹ (1.Kyushu Univ. ISEE)

[9a-PB2-4]FTIR analysis of carbon film deposition process during tetramethylsilane plasma

Atsuya Kuwada¹, Yuto Oishi¹, Masanori Shinohara², 〇Akihiro Iwata², Ryo Miyazawa³, Fumihiko Hirose³ (1.Grad. Sch. Eng. Fukuoka Univ., 2.Dept. of EE Fukuoka Univ., 3.Yamagata Univ.)

[9a-PB2-5]Hydrogen Selectivity of a QCM-Type Hydrogen Sensor Coated with Amorphous Carbon Films

〇(M1)Yusuke Oshima¹, Yasushi Ishiguro², Alanazi Ali³, Kenji Hirakuri¹, Kazuya Kanasugi¹ (1.Tokyo Denki Univ., 2.National Defense Acad, 3.King Saud Univ)

[9a-PB2-6]Surface Reactions on DLC Films Induced by High Density Plasma Irradiation

〇(M1)Sohta Kumagai¹, Keigo Takeda¹ (1.Meijo Univ.)

[9a-PB2-7]Effect of Dilution Gas on Characteristics of CO Plasma for Hydrogen-Free DLC Films Deposition

〇(M2)Mizuki Sato¹, Toru Harigai², Hiroyuki Kousaka², Akinori Oda¹ (1.Chiba Tech., 2.Gifu Univ.)

[9a-PB2-8]Assessment of Deposition Conditions on Bond Configurations of a-C:H films deposited using Plasma CVD

〇Soichiro Yoshida¹, Shinjiro Ono¹, Shunpei Ohara¹, Takamasa Okumura¹, Kunihiro Kamataki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ.)

[9a-PB2-9]Control of Titanium Surface Oxidation by Hydrogen-Added Atmospheric Pressure Non-Equilibrium RF Plasma and Its Application to Direct Ti/PEEK Bonding

〇Kosuke Takenaka¹, Kouki Ueno¹, Giichiro Uchida², Yuichi Setsuhara¹ (1.Univ. Osaka, 2.Nagoya Univ.)

[9a-PB2-10]Evaluation of p-Type Doping and Surface Defect Formation Mechanisms in MoS₂ Surface Induced by Nitrogen Plasma Treatment

〇Taichi Sakamoto¹, Akihisa Ogino¹ (1.Shizuoka Univ.)

[9a-PB2-11]Evaluation of the Effects of Specimen Enlargement on Plasma Electrolytic Oxidation of AZ91D

〇(M1)Raiki Nakano¹, Yuichiro Takemura¹ (1.Kindai Univ)

[9a-PB2-12]Control of Microarc Behavior in Plasma Electrolytic Oxidation

〇Syu Umeda¹, Yuichiro Takemura¹ (1.Kindai Univ.)

[9a-PB2-13]PEO treatment of magnesium and aluminum alloy joints

〇Ayuma Hata¹, Yuichiro Takemura¹ (1.Kindai Univ.)

[9a-PB2-14]Atmospheric-Pressure Plasma Oxidation of Cobalt Thin Films Using N₂–O₂ Plasma

〇Kai Takemura¹, Keigo Takeda¹ (1.Meijo Univ.)

[9a-PB2-15]Dynamic control of reactive species balance in SF6/O2 plasma for Si etching

〇(M2)Ibuki Kawano¹, Shuto Tsuchioka¹, Kenichi Inoue², Takayoshi Tsutsumi², Kenji Ishikawa² (1.Nagoya Univ. Eng., 2.Nagoya Univ. cLPS)

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