Presentation Information
[9a-S1-9]Evaluation of Interface Properties Using Charge Pumping at Cryogenic Temperatures
〇Wataru Miyagi1, Kazuki Watanabe1, Keito Yoshinaga1, Michinasa Morita1, Ryo Toyoshima1, Ken Uchida1 (1.Tokyo Univ.)
Keywords:
CryoCMOS,Interface traps,Charge pumping method
Interface characterization of MOSFETs at cryogenic temperatures is crucial for quantum computing applications. In this study, charge pumping (CP) current was successfully measured at cryogenic temperatures using a p-i-n FD-SOI MOSFET. The measurement frequency ranged from 10 kHz to 1 MHz. The CP current was found to decrease from 150 K to 50 K and then increase at lower temperatures. The physical origin of this temperature dependence will be discussed.
