Presentation Information
[9p-A22-1]Spatial resolution demonstration for Si-based stacked film analysis by IR near-field light
〇(D)Ryoga Odawara1, Yasuo Shimizu2, Koichiro Saga2, Yukio Kawano1,3,4 (1.Chuo Univ., 2.Sony Semiconductor Solutions Corporation, 3.NII, 4.KISTEC)
Keywords:
semiconductor,scannning near-field optical microscopy,Infrared light imaging
