Presentation Information

[9p-A22-1]Spatial resolution demonstration for Si-based stacked film analysis by IR near-field light

〇(D)Ryoga Odawara1, Yasuo Shimizu2, Koichiro Saga2, Yukio Kawano1,3,4 (1.Chuo Univ., 2.Sony Semiconductor Solutions Corporation, 3.NII, 4.KISTEC)

Keywords:

semiconductor,scannning near-field optical microscopy,Infrared light imaging