[9p-B31-1~8] Active Species Control, Interface Formation, and Functionalities: Perspectives Connecting Plasma and Carbon-Based Thin Films

1:40 PM - 2:10 PM JST(4:40 AM - 5:10 AM UTC)

[9p-B31-2] Understanding Carbon Material Formation Mechanisms through Reactive Species Diagnostics and Machine Learning

〇Hiroki Kondo¹, Yusuke Ando², Naoki Ueoka², Kenji Ishikawa³, Takayoshi Tsutsumi³, Masaru Hori³, Mineo Hiramatsu⁴, Yutaka Matsuo² (1.Kyushu Univ., 2.Nagoya Univ., 3.Nagoya Univ., Plasma, 4.Meijo Univ.)

Keywords:

Carbon nanomaterials,Plasma-enhanced chemical vapor deposition,Machine learning

Plasma-assisted processes are widely used for the synthesis and modification of carbon materials. Reactive species generated in plasmas play essential roles in surface reactions, structure formation, and material functionalities. However, the coexistence of numerous reactive species makes it difficult to quantitatively understand their individual contributions and synergistic effects. In this study, reactive-species diagnostics using optical emission spectroscopy (OES) and quadrupole mass spectrometry (QMS) were combined with explainable machine learning to investigate carbon material formation mechanisms. Hydrogenated amorphous carbon (a-C:H) films deposited by plasma-enhanced chemical vapor deposition were used as a model system. SHAP-based contribution analysis quantitatively evaluated the effects of dissociated and polymerized hydrocarbon species on film properties. The results revealed that carbon-rich unsaturated species contribute to improved etch resistance through increased carbon density, whereas hydrogen-rich species promote surface hydrogen termination and reduce etch resistance. The proposed approach provides mechanistic insights into the relationships among reactive species, surface reactions, structure formation, and material properties, and is applicable to a wide range of carbon materials and nanostructures.