[9p-B31-1~8] Active Species Control, Interface Formation, and Functionalities: Perspectives Connecting Plasma and Carbon-Based Thin Films

3:20 PM - 3:50 PM JST(6:20 AM - 6:50 AM UTC)

[9p-B31-5] Challenges of Carbon hard mask in Semiconductor Processes

〇Kohei Yazaki¹ (1.Tokyo Electron Ltd.)

Keywords:

semiconductor

This presentation describes the key requirements—high etch resistance, low stress, and suppressed shape variations—and clarifies the challenges in controlling film quality and stress.