[9p-E208-1~11] 7.3 Micro/Nano patterning and fabrication

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[9p-E208-1] Lithography onto Gently Curved Surfaces Using Collimate Far Proximity Exposure

〇Toshiyuki Horiuchi¹, Jun-ya Iwasaki¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

Keywords:

lithography on curved surface,proximity exposure,collimate illumination

To utilize for fabricating interconnection wirings and electric terminals on molded electrical or mechanical resin parts and covers, or developing health monitor devices just fitting to curved body parts, lithography to print rough patterns with widths of 100-500 μm on arbitrarily but gently curved surfaces simply and easily is under development. As a unique method, projection lithography using a pair of faced circular paraboloid mirrors has been investigated for several years. However, it is required to compensate the projected pattern distortions by estimating the distortions and modifying the reticle patterns in advance. To solve this inconvenience, a new lithography using collimate far proximity exposure was investigated here. Patterns were successfully printed uniformly in the fields without distortions.