The 87th JSAP Autumn Meeting 2026
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Session Details

Oral presentation7 Beam Technology and Nanofabrication : 7.3 Micro/Nano patterning and fabrication

[9p-E208-1~11]7.3 Micro/Nano patterning and fabrication

Wed. Sep 9, 2026 1:30 PM - 4:30 PM JST
Wed. Sep 9, 2026 4:30 AM - 7:30 AM UTC
E208 (First Year Education Bld. E Block)
1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[9p-E208-1]Lithography onto Gently Curved Surfaces Using Collimate Far Proximity Exposure

〇Toshiyuki Horiuchi1, Jun-ya Iwasaki1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)
1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)

[9p-E208-2]Evaluation of Resist-Process-Induced Aggregation by RSoXS

〇Ayumu Tanaka1, Shinji Yamakawa1, Masashi Yoshimura2, Naoki Hayase1, Tetsuo Harada1 (1.Uni. of Hyogo, 2.SPring-8 Service.)
2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)

[9p-E208-3]High-Dynamic-Range Optical Constant Measurements for Short-Wavelength EUV Lithography Using a CMOS Detector

〇(M1)Ryosuke Bogaki1, Naoki Hayase1, Masashi Yoshimura2, Shinji Yamakawa1, Tetsuo Harada1 (1.University of Hyogo, 2.SPring-8 Service Co., Ltd.)
2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[9p-E208-4]Resist Sensitivity Evaluation Using Short-Wavelength EUV at NewSUBARU

〇(M1)Takanari Nishida1, Shinji Yamakawa1, Masashi Yoshimura2, Naoki Hayase1, Tetsuo Harada1 (1.Hyogo Univ, 2.SPring-8 Service)
2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[9p-E208-5]Evaluation of blister formation condition on EUV photomask using high power irradiation tool at NewSUBARU

〇(M1)Masaru Nakazaki1, Hayase Naoki1, Yamakawa Shinji1, Harada Tetsuo1 (1.Univ. of Hyogo)
2:45 PM - 3:00 PM JST(5:45 AM - 6:00 AM UTC)

[9p-E208-6]Effect of Organic Ligand Structure on Resist Performance of Organic-Inorganic Hybrid Resists for EB and EUV Lithography

〇Hiroki Yamamoto1, Takashi Hamada1, Takahiro Kozawa2 (1.QST, 2.SANKEN Osaka Univ.)
3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[9p-E208-7]Mechanism of Surface Roughness Formation of Resist after Spin Coating on Step Substrates (2)

〇Yasuhiro Shikahama1, Takayoshi Honda1, Yoshiya Hagimoto1, Suguru Shiratori2 (1.Sony Semiconductor Solutions Corp., 2.Tokyo City Univ.)
3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

[9p-E208-8]Fabrication of slanted diffraction grating molds on Si and GC substrates using EBL with HSQ resist

〇Satoshi Fujieda1, Jun Taniguchi1 (1.Tokyo Univ. of Sci.)
3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[9p-E208-9]Increase in sensitivity of PMMA resist using alkyl acetate and alcohol mixed developer

〇Natsuko Hori1, Yukiko Kishimura1, Ryoichi Hoshino2, Hironori Asada1 (1.Yamaguchi Univ., 2.Fine Material System Inc.)
4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[9p-E208-10]Residue-Free UV-NIL Using a Photoresist Containing Silver Nanoparticles, and Conductivity Evaluation of the Transferred Pattern

〇(M2)Takumi Ashida1, Jun Taniguchi1 (1.Tokyo Univ. of Scie.)
4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[9p-E208-11]Fabrication of Anti-Reflective Self-Supporting Metal Films Using Soluble UV-Curable Resins.

〇TAICHI OGAWA1, Jun Taniguchi1 (1.Tokyo Univ. of Sci.)
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