Presentation Information

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[9p-E208-5]Evaluation of blister formation condition on EUV photomask using high power irradiation tool at NewSUBARU

〇(M1)Masaru Nakazaki¹, Hayase Naoki¹, Yamakawa Shinji¹, Harada Tetsuo¹ (1.Univ. of Hyogo)

Keywords:

Extreme Ultra Violet,blister

In EUV lithography, high-intensity EUV irradiation in a hydrogen atmosphere can induce blister formation and oxidation degradation of EUV masks, leading to reduced reflectivity and shortened mask lifetime. In this study, blister resistance of mask materials was evaluated using a high-intensity EUV irradiation system. In addition, oxidation-accelerated conditions using water vapor were investigated, and degradation mechanisms were analyzed through reflectivity measurements and X-ray absorption spectroscopy to establish an accelerated evaluation method.

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