Presentation Information
[9p-E208-8]Fabrication of slanted diffraction grating molds on Si and GC substrates using EBL with HSQ resist
〇Satoshi Fujieda1, Jun Taniguchi1 (1.Tokyo Univ. of Sci.)
Keywords:
Electron Beam Applications,Micro-/Nanopatterning and Micro-/Nanostructure Fabrication Technologies,Molds and Masks
To achieve high-precision fabrication of slanted surface-relief gratings (SRGs), which are promising key optical components for AR/VR waveguide displays, submicrometer slanted grating molds were fabricated on Si and glassy carbon (GC) substrates using electron-beam lithography with HSQ resist. The effects of substrate material and resist thickness on patterning accuracy were investigated. The results showed that high-quality structures with pitches down to 300 nm could be fabricated on GC substrates owing to the reduced electron backscattering. In addition, resist thickness was found to influence the resulting line width. UV nanoimprint replication using the fabricated molds will also be presented.