[9p-E215-1~20] 17.3 Applications

6:00 PM - 6:15 PM JST(9:00 AM - 9:15 AM UTC)

[9p-E215-18] Atomic Layer Deposition of Ultrathin Alumina Films on 2D Oxide Nanosheets

〇(M1)Yuiki Uejima¹, Wataru Sugimoto², Ryo Nouchi¹ (1.Osaka Metropolitan Univ., 2.Shinshu Univ.)

Keywords:

two-dimensional materials,dielectric film fabrication,conformal growth

Atomic layer deposition (ALD) enables the fabrication of uniform, ultrathin dielectric films; however, achieving conformal growth of such films on chemically inert two-dimensional materials remains challenging. Although surface oxidation treatments that promote surface nucleation can damage the material, we have previously demonstrated successful ALD growth on native-oxide-forming TaS₂ without any O₂ plasma treatment. In this talk, we report that conformal ALD growth of ultrathin alumina films is also feasible on two-dimensional oxide RuO₂ nanosheets without intentional O₂ plasma treatment.