[9p-PA1-1~52] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[9p-PA1-12] Uniform Coating and Estimation of Effective Sticking Coefficient in Three-Dimensional Nonwoven Strutures by Mist Chemical Vapor Deposition

〇Hajime Shirai^1,2, Yoshiaki Yamamoto⁴, Heiyan He⁴, Hideki Kurihara³, Fumiya Kobayashi², Hirotaka Sone¹, Toshinori Ohno⁴ (1.Saitama Univ., 2.Kanagawa Univ., 3.SAITEC, 4.Amaya Co., Ltd.)

Keywords:

Mist CVD,Nonwoven fabric,Uniform coating

Nonwoven materials with high porosity are promising for applications such as lithium-ion battery separators and anodes, catalyst supports, and filtration media. However, achieving uniform thin-film deposition throughout their complex three-dimensional structures remains a significant challenge. Mist chemical vapor deposition (mist-CVD), which utilizes droplet transport, offers the potential for efficient precursor delivery into high-aspect-ratio structures and porous materials. Nevertheless, the mechanisms of droplet capture and film formation within nonwoven substrates are still not fully understood.In this study, amorphous TiO_x films were deposited onto nonwoven substrates by mist-CVD using Ti(acac)₂(OiPr)₂ as the precursor.