[9p-PA1-1~52] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[9p-PA1-13] Sputter epitaxy of Zn_1-xMg_xO films on sapphire using thickness-controlled 3D MgO buffer layers

〇Hiroki Otsuyama¹, Hibiki Noguchi¹, Jocelyn Sutadharma¹, Okumura Takamasa¹, Kunihiro Kamataki¹, Kazunori Koga¹, Masaharu Shiratani¹, Naho Itagaki¹ (1.Kyushu Univ.)

Keywords:

Oxide semiconductor,Sputtering,Epitaxial growth