[9p-PA1-1~52] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[9p-PA1-14] Sputter epitaxy of Zn_1-xMg_xO films on sapphire: interface engineering with wurtzite MgO buffers and ZnO interlayers

〇(M2)Hibiki Noguchi¹, Hiroki Otsuyama¹, Kunihiro Kamataki¹, Takamasa Okumura¹, Kazunori Koga¹, Haruki Kiyama¹, Naho Itagaki¹ (1.Kyushu Univ.)

Keywords:

Oxide Semiconductor,Sputtering,Epitaxial Growth