[9p-PA1-1~52] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[9p-PA1-17] Fabrication of PdCoOx thin films by mist CVD

〇ryoma yoshida¹, Yuya morioka¹, Kei Mizumoto², ryosuke oohashi², Sohaib Hassan², Htet Su², Tosiyuki Kawaharamura^1,2,3 (1.Kochi Univ. of Tech., 2.Graduate School of Eng., 3.Res. Inst.)

Keywords:

PdCoOx,mist CVD

Layered oxide metals, represented by PdCoO₂, in which two-dimensional metals and insulators are alternately stacked, are attracting attention as novel interconnect materials. PdCoO₂ is a rare oxide that exhibits ultra-high conductivity surpassing that of bulk metals, owing to extremely low scattering within the Pd layer. It features the advantage of minimal resistance increase even when miniaturized. In this study, we attempted to fabricate PdCoO₂ thin films using mist chemical vapor deposition (mist CVD).