[9p-PA1-1~52] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[9p-PA1-18] Effect of Deposition and Post-Deposition Annealing Temperature on the Crystallization Behavior and Optical Properties of Mist-CVD-Deposited GaO_x Thin Films on c-plane Sapphire Substrates

〇(B)Sora Nakashima¹, Iori Yamasaki¹, Shunsuke Enoki¹, Misaki Nishikawa¹, Masatoshi Koyama¹, Akihiko Fujii¹, Toshihiko Maemoto¹ (1.Osaka Inst. of Tech.)

Keywords:

Ga2O3,Mist-CVD,amorphous