[9p-PA1-1~52] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[9p-PA1-49] Growth and Impurity Evaluation of α-Ga₂O₃ Films by Mist CVD Method using Gallium Oxide Polycrystalline Powder

〇(M1)Asato Terukina¹, Ryuma Iida¹, Soma Nishio¹, Hinata Nakahachi¹, Tohru Honda¹, Takeyoshi Onuma¹, Tomohiro Yamaguchi¹ (1.Kogakuin Univ.)

Keywords:

Gallium oxide,Mist CVD method,Impurity evaluation