[9p-PA1-1~52] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[9p-PA1-7] Growth of SnO_x Thin Films by Mist CVD Using a Formic Acid-Containing Precursor Solution

〇Shunsuke Tamura¹, Taro Iizuka¹, Haruki Ishikawa¹, Shinya Aikawa¹, Hiroki Nagai¹, Takeyoshi Onuma¹, Tohru Honda¹, Tomohiro Yamaguchi¹ (1.Kogakuin Univ.)

Keywords:

tin oxide,Mist CVD