[15a-S4_201-1~10] 3.1 Basic optics and frontier of optics

9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[15a-S4_201-2] Physical Picture and Numerical Modeling of Spatiotemporal Speckle in Optical Lithography

〇Tomohiro Shirai¹ (1.AIST)

Keywords:

statistical optics,numerical simulation,optical lithography

Excimer lasers remain widely used as light sources in optical lithography, but spatiotemporal speckles arising from their spatial and temporal coherence hinder the accurate rendering of fine patterns. In this study, we reformulate the behavior of spatiotemporal speckles using a theoretical framework different from previous approaches to clarify their physical picture. Furthermore, we propose a numerical modeling method that enables direct evaluation of speckle effects even in complex optical systems.