[15a-WL2_101-1~10] 6.3 Oxide electronics

9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[15a-WL2_101-2] Substrate dependence of ITO thin-film crystallization by KrF excimer laser annealing

〇Shinnosuke Uetsuki¹, Keita Katayama^1,2, Liu Yifan¹, Maiki Sato¹, Hisato Yabuta^1,2 (1.ISEE, Kyushu Univ., 2.Gigaphoton NextGLP, Kyushu Univ.)

Keywords:

laser annealing,Indium Tin Oxide,KrF excimer laser

The effects of substrate materials on the crystallization conditions of ITO thin films during KrF excimer laser annealing were investigated. ITO films deposited on alkali-free glass and Al2O3 substrates with different thermal conductivities were irradiated by laser pulses. A reduction in sheet resistance was achieved at lower fluence on glass substrates, whereas higher fluence was required on Al2O3 substrates. This difference is attributed to variations in thermal dissipation and thermal history during laser irradiation.